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CCD:CCD00010521

CAS:12064-62-9

MDL:MFCD00011026

MF / MW:Gd2 O3 / 362.497

Synonyms:氧化钆,99.9% METALS BASIS;纳米氧化钆;氧化钆,99.99% METALS BASIS;DIGADOLINIUM TRIOXIDE;GADOLIUM OXIDE;GADOLINIUM(III) OXIDE;纳米氧化钆,99.8% METALS BASIS,<100 NM(XRD);GADOLINIUM SESQUIOXIDE;氧化钆;GADOLINIUM OXIDE

CCD:CCD00003334

CAS:1333-84-2;1302-74-5;11092-32-3;1344-28-1;68389-42-4

MDL:MFCD00003424

MF / MW:Al2 O3 / 101.961

Synonyms:氧化铝,SP,99.999%;ALUMINUM OXIDE (GAMMA MOD);ALUMINA, NEUTRAL (ACTIVE);NANODUR(TM) X1130PMA;ALUMINIUM OXIDE, WEAKLY ACIDIC, BROCKMANN I;ALUMINA, ACTIVATED, ACIDIC, BROCKMANN I;ALUMINUM OXIDE FIBER;ALUMINA A-TLC;氧化铝,AR;ALUMINIUM OXIDE, NEUTRAL, BROCKMANN I;ALUMINUM OXIDE, (AL2O3) OPTICAL WINDOW‘1-3MM, 99.99%, 1.62NM'550, 200-5000NM, 2000-2200C;ALPHA ALUMINIUM OXIDE;GAMMA-ALUMINUM (III) OXIDE;ALUMINUM OXIDE;ALUMINUM OXIDE, SUBSTRATE POLISHED ONE SIDE R PLANE;高纯超细氧化铝,4N,晶型Α,Θ;ALUMINA N 32-63;ALUMINA, ACTIVATED, NEUTRAL, BROCKMANN I;ALIMINUM OXIDE BASIC A;ACTIVATED ALUMINA;NANOARC(R) AL-2220;ALUMINA DCC;ALUMINUM OXIDE, GAMMA-BETA;ALUMINUM OXIDE ON TLC ALU FOILS;ALUMINUM OXIDE POLISHING POWDER, NANOMETER GRADE;ALUNDUM;氧化铝,99.99% METALS BASIS ,5～6ΜM,粉末;FUSED ALUMINA;ALUMINUM OXIDE, NANOTEK(R);ALUMINIUM OXIDE 60 G NEUTRAL (TYPE E);RUBY;ALUMINUM OXIDE, SINGLE CRYSTAL 99.9% (METALS BASIS);ALUMINUM OXIDE, SUBSTRATE POLISHED TWO SIDES R PLANE;ALUMINUM OXIDE, BASIC FOR CHROMATOGRAPHY 200MESH;NANOTEK(R) AL-6081;ALUMINIUM OXIDES-TLC;ALUMINA;ALUMINUM OXIDE, COLLOIDAL LIQUID 60-100NM 10±0.5 % AS AL2O3 PH 6－7 10-100 MPA·S;ALUMINIUM OXIDE 150 BASIC;ALUMINUM OXIDE, ALPHA-BETA;ALUMINUM OXIDE, ACIDIC ACTIVITY: SUPER I FOR CHROMATOGRAPHY;ALUMINIUM OXIDE,BASIC;ALUMINA N 3-6;ALUMINUM OXIDE, NEUTRAL ACTIVITY: SUPER I FOR CHROMATOGRAPHY;水合氧化铝;ALUMINA, ACTIVATED;ALUMINUM OXIDE, PELLET DIA. 30MM HEIGHT 30MM;ALUMINUM OXIDE, CATALYST SUPPORT HIGH SURFACE AREA 1 4" RINGS;NANODUR(TM) X1121W;ALUMINUM OXIDE, COLLOIDAL LIQUID 60-100NM 18－20 % AS AL2O3 PH 6－7 30-200 MPA·S;ALUMINUM OXIDE, SUBSTRATE POLISHED TWO SIDES M PLANE;ALUMINIUM OXIDE,ACTIVE;ALUMINA, NEUTRAL, BROCKMAN ACTIVITY I;纳米氧化铝,99%,Γ相,20NM;氧化铝;ALUMINUM OXIDE, ACTIVATED, ACIDIC, BROCKMANN I;ALUMINUM OXIDE, BETA;ALUMINUM OXIDE, ALPHA 99.99% (METALS BASIS) 0.5-2.5 MICRON;ALUMINUM OXIDE 60 G;ALUMINUM OXIDE, BASIC ACTIVITY: SUPER I FOR CHROMATOGRAPHY;ALUMINUM OXIDE, CATALYST SUPPORT INTERMEDIATE SURFACE AREA;ALUMINUM OXIDE, NANODUR;ALUMINIUM OXIDE, NEUTRAL, BROCKMANN TYPE I;ALUMINA N 10-18;纳米氧化铝醇分散液,30 NM 粒径, 20 WT. % 异丙醇溶液;ALUMINA, CRUCIBLE, TALL FORM, W/LID, 50ML;ALUMINUM OXIDE, ACTIVATED, NEUTRAL, BROCKMANN GRADE II;中性氧化铝;ALUMINUM OXIDE, TARGET 99.99%;ALUMINUM OXIDE,ACTIVATED, DEUTERATED;ALUMINA C;氧化铝陶瓷;氧化铝球;ALUMINUM OXIDE, COLLOIDAL LIQUID 60-100NM 18－20 % AS AL2O3 PH 4－4.5 30-200 MPA·S;ALUMINUM OXIDE ON TLC-PLATES;ALUMINA N-TLC;ALUMINIUM OXIDE (ALPHA TYPE);ALUMINUM OXIDE, ACIDIC GR;GAMMA-ALUMINIA;ALUMINIUM OXIDE;ALUMINA G-TLC;ALUMINA N;ALUMINA I;ALUMINA, ACTIVATED, BASIC, BROCKMANN I;ALUMINUM OXIDE, ACTIVATED, NEUTRAL;氧化铝棉;TLC CARDS ALUMINIUM OXIDE;ALUNDUM RR;ALUMINUM OXIDE, ALPHA 99.95% (METALS BASIS) 0.8 MICRON POWDER;纳米氧化铝水分散液;ACTIVATED ALUMINA FOR DESICCANT;ALUMINUM OXIDE BASIC A;碱性氧化铝,200-300目;ALUMINUM OXIDE, G NEUTRAL FOR TLC;ALUMINUM OXIDE, ALPHA 99.999% (METALS BASIS) 10-20 MICRON POWDER;ALUMINA, BASIC, BROCKMAN ACTIVITY I;ALUMINUM OXIDE 90 ACTIVE;ALUMINUM TRIOXIDE;ALUMINA, ACIDIC, BROCKMANN I;INHIBITOR REMOVER;ALUMINIUM OXIDE 90, ACTIVE BASIC;ALUMINUM OXIDE, 90 STANDARDISED (0.063-0.200MM)(ACTIVITY STAGE II-III FOR CHROMATOGRAPHY ADSORPTION ANALYSIS ACC TO BROCKMANN;ALUMINIUM OXIDE 60GF254;ALUMINUM OXIDE, (AL2O3) OPTICAL WINDOW‘3-4MM, 99.99%, 1.62NM'550, 200-5000NM, 2000-2200C;Α相纳米氧化铝分散浆;ANALTECH TLC UNIPLATES(TM): ALUMINA MATRIX;ALUMINIUM OXIDE 90;ALUSPHER(R);氧化铝G;ALUMINUM OXIDE, ALPHA 99.98% 12-18UM HEXAGONAL LAMELLAR OR ELLIPSOID;ALUMINA B 18-32;ALUMINUM (III) OXIDE;ALUMINA, ACID, BROCKMAN ACTIVITY I;ALUMINUM OXIDE, 60 G NEUTRAL (TYPE E) FOR THIN LAYER CHROMATOGRAPHY;ALUMINA N 18-32;GEDURAN(R) AL 90;纳米氧化铝,99.99% METALS BASIS,Α相,30NM;ALUMINUM OXIDE, GAMMA-PHASE, ALPHA-PHASE;ALUMINUM OXIDE, R FOR CHROMATOGRAPHY;氧化铝,0.7-1.6MM,元素分析仪专用;ALUMINUM OXIDE, COLLOIDAL LIQUID 60-100NM 14－15 % AS AL2O3 PH 6－7 30-200 MPA·S;ANTI-BUMPING GRANULES FUSED ALUMINA;ALUMINUM OXIDE, 60 GF254 NEUTRAL (TYPE E) FOR THIN LAYER CHROMATOGRAPHY;GAMMA-ALUMINA, LOW SODA;ALUMINUM OXIDE, SUBSTRATE POLISHED TWO SIDES A PLANE;ALUMINIUM OXIDE NEUTRAL;ALUMINIUM OXIDE, ACID, BROCKMANN TYPE I;ALUMINUM OXIDE, SUBSTRATE POLISHED TWO SIDES C PLANE;ALUMINA A 18-32;Γ-氧化铝;中性氧化铝,200-300目;ALUMINIUM OXIDE, ACTIVATED;ALUMINUM OXIDE, ACIDIC;ALUMINUM OXIDE, BETA, 99.99%;ALUMINUM OXIDE, ACTIVE MICROBALL 30-200 MESH FOR DESICCATION & CATALYSATION;ALUMINUM OXIDE, 99.99+% BELOW 0.5UM NANOMETER SIZE;Α相纳米氧化铝分散浆,Α相,30 NM 粒径, 20 WT. % 水溶液;氧化铝,99.99% METALS BASIS,晶型Α,0.20ΜM;NANODUR(R) AL-2420;ALUMINUM OXIDE, ACID;ALUMINA B-TLC;BOILING STONES;ALUMINA ACTIVATED 200;氧化铝,99.99% METALS BASIS,Α晶型约95%,晶型Γ约5%,80NM;ALUMINUM OXIDE, ACTIVATED, GAMMA;ALUMINUM OXIDE, C FOR CHROMATOGRAPHY;ALUMINUM OXIDE, SUBSTRATE POLISHED ONE SIDE C PLANE;ALUMINUM OXIDE, BASIC FOR TLC;BOILING STONE;RIDOX OXYGEN SCAVENGER;ALUMINUM OXIDE, RP C18 FOR LUQUID CHROMATOGRAPHY;ALUMINA N TYPE I;ALUMINIUM OXIDE 60;低比表面积标准物质;ALUMINIUM OXIDE BASIC;ALUMINUM OXIDE, ACTIVATED, GAMMA, BASIC;ALUMINUM OXIDE, CALCINED 1-2 UM 99+%;ALUMINUM OXIDE, ALPHA 99.98% 3-6UM HEXAGONAL LAMELLAR OR ELLIPSOID;ALUMINUM OXIDE, POLYMERIC PRECURSOR;ALUMINUM OXIDE, GAMMA;ALUMINA, ACTIVATED, BASIC;ALUMINUM OXIDE, NEUTRAL;ALUMINIUM OXIDES-PLC;ALUMINUM OXIDE 60 GF254;CORUNDUM;ALUMINUM OXIDE, COLLOIDAL LIQUID 60-100NM 18 % AS AL2O3 PH 4－4.5 500 MPA·S;ALUMINUM OXIDE, 99+% INSULATING POWDER;ALUMINUM OXIDE, NEUTRAL 75-300 MESH ACTIVITY: I FOR CHROMATOGRAPHY;ALUMINA ACTIVATED 300;纳米级氧化铝,99.99% METALS BASIS,晶型Γ,20NM;BOILEEZERS GRANULES;ALUMINUM OXIDE, GAMMA-ALPHA 99.99% (METALS BASIS);ALUMINUM OXIDE, CALCINED, GR 99+%;NANOTEK(R) AL-6051;介孔三氧化二铝比表面积、总孔容及孔径标准物质;ALUMINUM OXIDE ON TLC-GLASS PLATES;ALUMINA, NEUTRAL, BROCKMANN I;纳米氧化铝,99.9% METALS BASIS,Α相,30NM,亲油型;ALUMINIUM OXIDE, BASIC, BROCKMANN I;ALUMINUM OXIDE, ALPHA;ALUMINUM OXIDE, DCC FOR CHROMATOGRAPHY;ALUMINUM OXIDE, ALPHA 99.99% (METALS BASIS);酸性氧化铝,100-200目;纳米氧化铝;ALUMINUM OXIDE 90;ALUMINA A;ALUMINUM OXIDE, MESOPOROUS;ALUMINUM OXIDE, GAMMA-PHASE;纳米氧化铝醇分散液;ALUMINUM OXIDE, ACTIVE;纳米级氧化铝;ALUMINUM OXIDE, SUPER ACTIVATED, ACIDIC;ALUMINUM OXIDE, SUBSTRATE POLISHED ONE SIDE A PLANE;氧化铝G,TLC专用;碱性氧化铝,100-200目;ALUMINUM OXIDE, (AL2O3) OPTICAL WINDOW‘F10X3MM, 99.99%, 1.62NM'550, 200-5000NM, 2000-2200C;ALUMINUM OXIDE, COLLOIDAL LIQUID 60-100NM 9±0.5 % AS AL2O3 PH 4－4.5 30 MPA·S;ALUMINUM OXIDE, (AL2O3) OPTICAL WINDOW‘5-7MM, 99.99%, 1.62NM'550, 200-5000NM, 2000-2200C;ALUMINIUM OXIDE 60 GF254 NEUTRAL (TYPE E);ALUMINUM OXIDE, 99.995% BELOW 0.5UM NANOMETER SIZE;ALUMINUM OXIDE, 98+% EXTRA PURE;ALUMINUM OXIDE, COLLOIDAL LIQUID 60-100NM 14－15 % AS AL2O3 PH 4－4.5 30-200 MPA·S;高纯超细氧化铝;ALUMINA A ACTIVITY I;ALUMINUM OXIDE, BASIC;ALUMINA TYPE II-III;ALUMINUM OXIDE, ALPHA-PHASE;ALUMINIUM OXIDE, ACIDIC, BROCKMANN I;ALUMINUM OXIDE, ACTIVATED CATALYST SUPPORT 99% (METALS BASIS);ALUMINA, ADSORPTION;NANOARC(R) R1130PMA;ALUMINUM OXIDE, ACTIVATED, ACIDIC;ALUMINUM OXIDE, NEUTRAL 200-300 MESH GR;ALUMINUM OXIDE, ANHYDROUS DESICCANT;ALUMINUM OXIDE, ALPHA-PHASE, GAMMA-PHASE;ALUMINUM OXIDE, COLLOIDAL SOLID TPYE 18+% COLLOID 60+% SOLID;NANOARC(R) R1121W;ALUMINA, NEUTRAL;活性氧化铝,80-100目 GC;RONAFLAIR(TM) WHITE SAPPHIRE;SAPPHIRE;GAMMA-ALUMINA;ALUMINUM OXIDE, NEUTRAL 100-200 MESH GR;碱性氧化铝;ALUMINIUM OXIDE, BASIC, BROCKMANN TYPE II;ALUMINUM OXIDE, ALPHA 99.9% (METALS BASIS) 20 MICRON POWDER;ALUMINUM OXIDE 60;ALUMINUM OXIDE, ALPHA 99.98% 6-12UM HEXAGONAL LAMELLAR OR ELLIPSOID;SPE AL-N(ALUMINA);ALUMINA B TYPE I;ALUMINIUM OXIDE ACIDIC;ALUMINUM OXIDE G;GAMMA-ALUMINUM OXIDE;ALUMINUM OXIDE, GEL CARBONIZED ACTIVATED;纳米氧化铝水分散液,5-10 NM 粒径, 20 WT. % 水溶液;纳米氧化铝,99.99% METALS BASIS,Γ相,10NM;氧化铝,99.99% METALS BASIS,Α晶型约90%,晶型Γ约10%,50NM;氧化铝,200-300目;ALUMINA HYDRATE;ALUMINUM OXIDE, GAMMA-ALPHA;ALUMINUM OXIDE, ALPHA 99.98% 18-25UM HEXAGONAL LAMELLAR OR ELLIPSOID;ALUMINUM OXIDE, ACTIVATED, BASIC;ALUMINA B 32-63;ALUMINA,ACTIVATED;纳米氧化铝,99.9% METALS BASIS,Α相,30NM,亲水型;ALUMINIUM OXIDE, BASIC, BROCKMANN TYPE I;ALUMINUM OXIDE, ACTIVE GRANULAR 99+%;氧化铝,99．99%,镀膜;ALUMINUM OXIDE, SUBSTRATE POLISHED ONE SIDE M PLANE;ALUMINUM OXIDE, ALPHA 99.99% (METALS BASIS) 10-15 MICRON;ALUMINUM OXIDE, CATALYST SUPPORT LOW SURFACE AREA;ALUMINUM OXIDE, ACIDIC 75-300 MESH ACTIVITY: I FOR CHROMATOGRAPHY;ALUMINA, CRUCIBLE, TALL FORM, W/LID, 100ML;ALUMINUM OXIDE, BASIC 75-300 MESH ACTIVITY: I FOR CHROMATOGRAPHY;活性氧化铝;三氧化二铝比表面积标准物质;AEROXIDE(R) ALU C;ALUMINUM OXIDE, PASTE;氧化铝棉,元素分析仪专用;ALUMINA A TYPE I;ALUMINUM OXIDE, ACTIVATED 350MESH;ALUMINUM OXIDE, BASIC 100-200 MESH GR;ALUMINA B;ALUMINUM OXIDE, ACTIVATED, NEUTRAL, GAMMA-PHASE;酸性氧化铝;ALUMINUM OXIDE, SUBSTRATE POLISHED ONE SIDE M PLANE;ALUMINUM OXIDE, 90 ACTIVE BASIC (0.063-0.200 MM) ACTIVITY S;ALUMINUM OXIDE, CATALYST SUPPORT INTERMEDIATE SURFACE AREA (LOW SIO );ALUMINUM OXIDE, ACTIVATED;ALUMINUM OXIDE/TLC-CARDS;ALPHA-ALUMINUM (III) OXIDE;ALUMINA N 7-12;中性氧化铝,100-200目;ALUMINUM OXIDE, SUPER ACTIVATED, BASIC;氧化铝,99.998% METALS BASIS ,块状;活性氧化铝,60-80目 GC;ALUMINUM OXIDE, (AL2O3) OPTICAL WINDOW‘0.8-1MM, 99.99%, 1.62NM'550, 200-5000NM, 2000-2200C;ALUMINUM OXIDE, COLLOIDAL LIQUID 60-100NM 10±0.5 % AS AL2O3 PH 4－4.5 10-100 MPA·S;ALPHA-ALUMINA;ALUMINIUM OXIDE 60G;活性氧化铝,40-60目 GC

CCD:CCD00010517

CAS:7440-54-2

MDL:MFCD00011022

MF / MW:Gd / 157.25

Synonyms:GADOLINIUM, AAS STANDARD;钆;GADOLINIUM;金属钆,99.9%，粉末;GADOLINIUM METAL;GADOLINIUM ATOMIC ABSORPTION STANDARD;GADOLINIUM ICP STANDARD;GADOLINIUM PLASMA STANDARD;钆标准溶液,1000ΜG/ML;钆标准溶液;金属钆;钆标准溶液,1000&MICRO;GADOLINIUM STANDARD;GADOLINIUM ICP/DCP STANDARD;GADOLINIUM SINGLE ELEMENT STANDARD;GADOLINIUM HYDROUS

CCD:CCD00074022

CAS:19423-81-5;13450-84-5

MDL:MFCD00149732

MF / MW:Cl3 Gd . 6 H2 O / 371.698

Synonyms:氯化钆(III)，六水,99.9% METALS BASIS;三氯化钆六水合物;GADOLINIUM(III) CHLORIDE HEXAHYDRATE;氯化钆(III)，六水;GADOLINIUM CHLORIDE, HEXAHYDRATE;氯化钆(III) ,六水;GADOLINIUM CHLORIDE;GADOLINIUM CHLORIDE HEXAHYDRATE;氯化钆(III) ,六水,99%;氯化钆六水;氯化钆六水合物;GADOLINIUM CHLORIDE, HYDROUS

CCD:CCD00033243

CAS:13818-75-2;30010-20-9

MDL:MFCD00049741

MF / MW:Br3 Gd / 396.962

Synonyms:溴化钆(III),无水, 粉末, 99.99% METALS BASIS;GADOLINIUM BROMIDE;GADOLINIUM(III) BROMIDE;超干溴化钆;溴化钆(III);溴化钆

CCD:CCD00014761

CAS:13765-26-9

MDL:MFCD00016113

MF / MW:F3 Gd / 214.244

Synonyms:氟化钆(III);GADOLINIUM(III) FLUORIDE;氟化钆(III),无水, 粉末, 99.99% METALS BASIS;GADOLINIUM FLUORIDE;GADOLINIUM TRIFLUORIDE;氟化钆

CCD:CCD00014762

CAS:13572-98-0

MDL:MFCD00016114

MF / MW:Gd I3 / 537.95

Synonyms:GADOLINIUM IODIDE;碘化钆(III),无水, 粉末, 99.99% METALS BASIS;碘化钆(III);GADOLINIUM(III) IODIDE;超干碘化钆

CCD:CCD00074023

CAS:13628-54-1;13450-87-8;155788-75-3

MDL:MFCD00149734

MF / MW:2 Gd . 3 O4 S . 8 H2 O / 746.804

Synonyms:硫酸钆;GADOLINIUM(III) SULFATE;硫酸釓;GADOLINIUM SULFATE;硫酸钆(III),≥99.9% METALS BASIS;硫酸钆(III)八水;硫酸钆(III) 八水合物,≥99.99% METALS BASIS;GADOLINIUM SULFATE OCTAHYDRATE;GADOLINIUM(III) SULFATE OCTAHYDRATE;GADOLINIUM SULFATE, HYDROUS;硫酸钆(III) 八水合物;硫酸钆(III)